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RuDER® for Ru and RuO2

 RuDER

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                        Melting point        :17°C
                        Vapor pressure    :0.1Torr @75°C
                        Decomp. temp.    :270°C
                        Viscosity              :7cP @25°C


Thermal Stability (Isothermal TG)

2.-Thermal-Stability--Isothermal-TG-.png

Thermal CVD with O2

  

Temperature Dependency (on SiO2 sub.)


3.-Temperature-Dependency--on-SiO2-sub.-Cycle-Dependency--on-SiO2-sub.-.png Arrehenius plot of the growth rate of
Ru films deposited by RuDER

Nucleation Characteristics


4.-Nucleation-Characteristics-update1.png

Thermal ALD

  

Cycle Dependency (on SiO2 sub.)


5.-Cycle-Dependency--on-SiO2-sub.-.png
J. Electrochem. Soc., 154 (2) D95 (2007)

Improvement of Ru Film Morphology


6.-Improvement-of-Ru-Film-Morphology-update.png