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Tcursor® series: Ts-Hf3 for HfO2

 Characteristics
  • Melting point: <-20°C
  • Vapor pressure: 0.1Torr (77°C)
  • Decomposition temperature: 240°C

Ts-Hf3, thermal properties, semiconductor

Thermal CVD with O2

  

Ts-Hf3 Ts-Hf3, semiconductor, precursor, tcursor series

Step Coverage

  

Ts-Hf3, precursor, semiconductor, step coverage