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Tcursor® series: Ts-Ti9

 Characteristics
  • Melting point: -20°C
  • Vapor pressure: 0.1Torr (59°C)
  • Sufficient volatility and thermal stability
  • Short incubation time
  • High deposition rate

Thermal Properties

  

precursor, high volatility, thermal properties

Thermal CVD with O2

  

precursor, thermal, O2, CVD